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Sill Optics 343-355nm 1X - 3X Variable Beam Expander, S6EXZ5310-574

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Stock #70-169 2 In Stock
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C$3,067.26
Volume Pricing
Qty 1-4 C$3,067.26 each
Qty 5+ C$2,762.06 each
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Specifications

General

Model Number:
S6EXZ5310-574
Type:
Beam Expander
Style:
Continuous Variable Magnification

Physical & Mechanical Properties

Length (mm):
85.20
Weight (g):
0.30
Housing Diameter (mm):
47.00
Pointing Accuracy (mrad):
<1

Optical Properties

Coating:
355
Design Wavelength DWL (nm):
355
Entrance Aperture (mm):
10.50
Exit Aperture (mm):
20.00
Expansion Power:
1X -3X
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica
Transmission (%):
>97
Coating Specification:
343nm - 355nm R < 0.20% - low absorption
Wavelength Range (nm):
343 - 355
Damage Threshold, By Design: Damage threshold for optical components varies by substrate material and coating. Click here to learn more about this specification.
1.0 J/cm2 per 1ns pulse at 50Hz
Divergence Adjustment:
Rotating Optics

Threading & Mounting

Mounting Threads:
C-Mount

Regulatory Compliance

Certificate of Conformance:

Product Details

  • 1X – 3X and 1X – 8X Variable Magnification
  • High Damage Thresholds up to 5.0 J/cm² (1ns, 50Hz)
  • Motorized Magnification Versions Available

Sill Optics Variable Beam Expanders are designed to optimize focus diameter, focus position and beam propagation within a laser system. All optical elements within these beam expanders are constructed from fused silica substrates featuring a special low-absorption coating to minimize thermal effects.  These beam expanders can withstand the high thermal strain of small beam diameters and provide stable and reliable performance while utilizing high average or high peak power lasers. Sill Optics Variable Beam Expanders are available for use with 355nm, 532nm, and 1064nm design wavelengths and feature high damage thresholds for pulsed lasers up to 5.0 J/cm² (1ns, 50Hz). These beam expanders are ideal for ideal for high power laser applications where magnification changes may be required, such as prototyping, solar cell manufacturing, confocal microscopy, or R&D.