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Extreme Ultraviolet (EUV) Dichroic Filters

Extreme Ultraviolet (EUV) Dichroic Filters

Extreme Ultraviolet (EUV) Dichroic Filters

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  • Separates EUV from the NIR Laser Source in High Harmonic Generation
  • Designed for High Damage Thresholds
  • Supports Applications from 10 – 40nm

Extreme Ultraviolet (EUV) Dichroic Filters, also known as beam separators, are intended for high harmonic generation applications by providing a high separation efficiency between the EUV and NIR wavelengths. Featuring a Fused Silica substrate, these filters support higher laser powers than the alternative Brewster’s angle beam separators and EUV filters. EUV Dichroic Filters feature a broad bandwidth range from 10nm to 40nm. In addition to high harmonic generation, these filters can also be used in systems that support EUV applications such as EUV lithography, EUV nanomachining, coherent diffractive imaging, and ultrafast attosecond pulse generation.

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