Name: 13.5nm, 25.4mm Dia, 45° AOI, EUV Flat Mirror
SKU: 38-760
Price: C$3,528.00

13.5nm, 25.4mm Dia, 45° AOI, EUV Flat Mirror

Extreme Ultraviolet (EUV) Flat Mirrors

Stock #38-760 In Stock

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C$3,528.00

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C$3,528.00

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Diameter (mm):

25.40 ±0.25

Surface Flatness (P-V):

λ/10 @ 632.8nm

Single Crystal Silicon

Back Surface:

Commercial Polish

Surface Quality:

10 - 5

Coating Specification:

R_abs >65% @ 13.5nm, 45° (s-pol)

Coating:

Mo/Si Multilayer
Top Layer: Silicon

Coating Type:

Metal/Semiconductor

Angle of Incidence (°):

Clear Aperture (%):

Design Wavelength DWL (nm):

13.5

Edges:

Fine Ground

Parallelism (arcmin):

Surface Roughness (Angstroms):

<5 RMS

Thickness (mm):

6.35 ±0.508

Thickness Tolerance (mm):

0.508

Type:

Flat Mirror

Wavelength Range (nm):

12.92 - 13.90

Full Width-Half Max FWHM (nm):

0.98

Center Energy (eV):

Regulatory Compliance

RoHS:

Compliant

Certificate of Conformance:

View

Product Family Description

Maximum Achievable Reflection at 13.5nm
Designed for EUV Beam Steering and Harmonic Separation
5° and 45° AOI Versions Available

Extreme Ultraviolet (EUV) Flat Mirrors are multilayer mirrors designed for maximum achievable reflectance at the design wavelength and angle of incidence. These mirrors feature a coating deposited on a super-polished single crystal silicon substrate and surface roughness less than 3Å RMS. The 45° AOI mirrors are useful for steering s-polarized beams, while the 5° AOI mirrors may be used with unpolarized beams. Applications for EUV mirrors include Coherent Diffractive Imaging (CDI) and materials science research. Extreme Ultraviolet (EUV) Flat Mirrors can also serve as harmonic selectors for High Harmonic Generation (HHG) beams.

Note: Test data from each mirror's production run sample included.